ALD Furnace
OTF-1200X-ALD
ALD-1200X-R-4
ALD-1200X-4
OTF-1200X-ALD is a dual zone tube furnace combining ALD ( Atomic Layer Deposition ) and PECVD ( plasma enhanced chemical vapor deposition )
for preparing new generation thin film
- Two 10 ms ALD valves for ultra-thin film deposition
- Lower temperature processing is required compared to the conventional CVD
- High heating & cooling rate using sliding furnace
- Dual heating zone to create thermal gradient up to 500ºC
- 1100ºC Max. working temperature in the tube furnace
- 1100ºC Max. working temperature in pre-heater for heating vapor phase or evaporating solid materials
- Rapid cooling & Heating for growing 2D materials
ALD-1200X-4 is a 4" tube furnace combining with two-channel ALD valves and one channel liquid-vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film, The smart design makes ALD more cost-effective and affordable for every research group.
ALD-1200X-R-4 is a 4" rotation tube furnace combining with two-channel ALD valves and one channel liquid-vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery to make the surface coating on powder by both ALD and CVD. The smart design makes ALD more cost-effective and affordable for every research group.
Price: RFQ
Price: RFQ
Price: RFQ
You can find all MTI ALD Furnace here: