OTF-1200X-II-ZL is a hybrid PVD and CVD ( HPCVD) deposition system with four evaporation sources for preparing multilayer 2D materials up to 1200oC. The system is consists of a dual-zone split tube furnace with the revolving sample feeding system that can drive the crucible into a processing tube at the desired temperature in the different position of the heating zone. The revolving feed system can push and draw a crucible with evaporation material through the atmosphere controlled tube furnace and sequentially evaporate the material one by one upto four crucibles as the program. Its built-in PLC touchscreen allows users to manage the feeding method and monitor the temperature of each sample. Two 30-segment programmable PID temperature controllers provide excellent control without temperature overshooting.